Sofics technology has been applied for many different applications. Specifically for high-speed interfaces or high-bandwidth wireless applications the parasitic capacitance of the ESD cells need to be as low as possible.
Sofics solutions typically have 30% to 50% lower capacitance compared to the foundry solutions with the same ESD robustness.
Examples in different processes
Examples for different process nodes are shown below. This is just a subset of cells proven on silicon and in mass production. All cells can be ported to other processes. The actual numbers (ESD robustness, leakage, capacitance, area) may vary slightly, also depending on the circuit to be protected, process, voltage level.
